The treatment challenge
Support high-purity oxidation workflows for compatible wafer cleaning and advanced deposition processes. Actual performance depends on contaminant load, temperature, pH or humidity, ozone demand, transfer conditions and the required treatment objective.
Where ozone fits
Ozone is produced on site and introduced at a controlled point in the process. A complete treatment train may include feed-gas preparation, generation, injection or distribution, a contact stage, residual management, monitoring and safety interlocks.
Potential process benefits
- Rapid oxidation for suitable contaminants and microorganisms.
- On-site generation without long-term oxidant storage.
- Flexible integration as a primary, polishing or odour-control step.
- Decomposition back toward oxygen after reaction.
Engineering inputs
System selection begins with flow, water or air analysis, current treatment stages, target quality, operating hours, space, utilities and applicable safety requirements. Pilot testing may be recommended for complex matrices.
Get an application recommendation
Send your process data so our team can establish a treatment basis and suitable equipment configuration.
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